* P(gun)]
SҶƄztģ
ӆ؛K
r
1
200.00Ԫ/
(yng)(bio)}SҶƄztģ
r늃x
l(f)˾|ݸк\W(xu)Ʒ˾
؛10000000
(lin)ϵˣС
l(f)؛cV| |ݸ |ݸ
l(f)rg20211014
Ч20211113
ھԃPھԃP
a(chn)ƷCϢ|(zh)δӋ
ܰѣՈMÌHķߴʩƷҪM(jn)ƷCһ棨؛SC뾳zCA(y)C¹ڲzy棩
Ϣ
zt Photomask substrates
Ԕ(x)f
ztһNӲģϣĤǮ(dng)ǰδ(x)ӹĤйϣஔ(dng)õĸйzƽ߹❍ȵIJͨ^ֱſ؞R䣨SPeϵt-tĤγtĤͿһӹ¿gַQzgƳɄztztĤĻģ
ԣztиߵĸй`߷ֱȱcܶĥԺ坍̎ʹÉLc
(yng)
a(chn)ƷV(yng)ڰ댧(do)w·оƬ·ܶܡ댧(do)wԪ@ʾW(xu)ИI(y)Ĥܶӡƾ·壨PCBИI(y)
|ݸк\W(xu)Ʒ˾Ϣ
Ia(chn)ƷԪӰyx,I(y)׃R^,(bio),ֱʰ,У(zhn)y,ֳ,a,ֹRƬ,R,R,R,ƽƽ,ƽƽ,W(xu)_,ͶӰ,ZSyԇx ˾ݣ2010
˾W(wng)ַhttp://hcgxcy.glass.com.cn
^(q)V| |ݸ |ݸ
W(wng)ַ: http://hcgxcy.glass.com.cn
a(chn)Ʒԣ
ӋλK ؛10000000 Сӆ1 a(chn)Ʒr200.00 Ʒƣ Ҏ(gu)̖ bf
˾W(wng)ַhttp://hcgxcy.glass.com.cn
^(q)V| |ݸ |ݸ
W(wng)ַ: http://hcgxcy.glass.com.cn
a(chn)Ʒԣ
ӋλK ؛10000000 Сӆ1 a(chn)Ʒr200.00 Ʒƣ Ҏ(gu)̖ bf
SҶƄzt a(chn)Ʒśr
W(xu)ǹ늼g(sh)a(chn)I(y)ĻA(ch)ҪMɲ֡e20o(j)90ԺSW(xu)cϢƌW(xu)²ϿƌW(xu)IJںӻA(ch)ϵĹW(xu)ڹݔ⃦@ʾI(lng)đ(yng)øͻwM(jn)ɞϢǹϢg(sh)l(f)չĻA(ch)l֮һ(j)2013-2017ЇW(xu)ИI(y)a(chn)NcͶYA(y)y桷(sh)(j)@ʾS(ni)(jng)(j)m(x)(wn)l(f)չЇW(xu)ИI(y)l(f)չѸ͡(j)ҽy(tng)Ӌ?jn)?sh)(j)@ʾ2010꣬W(xu)ИI(y)Ҏ(gu)ģI(y)(sh)_(d)246ИI(y)ȫꌍF(xin)N234.05|ԪͬL53.70%;F(xin)15.37|ԪͬL87.10%;Ya(chn)Ҏ(gu)ģ_(d)264.50|ԪͬL77.49%ڹW(xu)ИI(y)ԇ(ni)N۞ΣC(j)Ӱ^СИI(y)ȻF(xin)^õL^